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High-purity and ultra-high-purity aluminum
Chemical purity:
99,996 – 99,998% (4N6 - 4N8)
99,999 - 99,9999% (5N - 6N)
Production method: electrolysis
(4N6-4N8), zone melting (5N-6N)
Impurities: total ≤ 0.001% (for 6H), detailing for 30+ elements
Delivery form: pigs, ingots, cut-to-size blanks according to the technical specifications
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High-purity and ultra-high-purity aluminum
Chemical purity:
99,996 – 99,998% (4N6 - 4N8)
99,999 - 99,9999% (5N - 6N)
Production method: electrolysis
(4N6-4N8), zone melting (5N-6N)
Impurities: total ≤ 0.001% (for 6H), detailing for 30+ elements
Delivery form: pigs, ingots, cut-to-size blanks according to the technical specifications
We will call you back!
Need a consultation? Leave your contact information, and we'll get back to you with answers!
Leave a request
Aluminum А995, А4Н6
✓ Ingots 16 kg,
on pallets of 1 ton.
MORE DETAILS
Aluminum А5Н, А5Н5
✓ Semi-round and round ingots,
2.5 - 6 kg each.
MORE DETAILS
Aluminum А6Н
✓ Semi-round and round ingots,
2.5 - 6 kg each.
MORE DETAILS
High purity aluminum is a metal with a base material content of 99.999% (5N) to 99.9999% (6N), obtained by electrolytic refining and zone melting methods for use in high-tech industries.
Key Features:
Aluminum A4H6, A995
Purity of base material: ≥ 99.996 – 99.998%
Total impurity content: ≤ 0.001% (10 ppm)
Iron (Fe): ≤ 20 ppm
Silicon (Si): ≤ 15 ppm
Copper (Cu): ≤ 5 ppm
Electrical conductivity: ≥ 63% IACS
Density: 2.70 g/cm³
Aluminum A6H
Purity of base material: ≥ 99.9999%
Total impurity content: ≤ 0.0001% (1 ppm)
Iron (Fe): ≤ 1 ppm
Silicon (Si): ≤ 0.5 ppm
Copper (Cu): ≤ 0.3 ppm
Electrical conductivity: ≥ 64.5% IACS
Density: 2.70 g/cm³
The material is designed for use in industries where the following are critical:
→ Ultra-low impurity content for stable electrical properties
→ Reproducible characteristics in mass production
→ Compliance with international standards for export
SUBMIT A REQUEST
High purity aluminum is a metal with a base material content of 99.999% (5N) to 99.9999% (6N), obtained by electrolytic refining and zone melting methods for use in high-tech industries.
Key Features:
Aluminum A4H6, A995
Purity of base material: ≥ 99.996 – 99.998%
Total impurity content: ≤ 0.001% (10 ppm)
Iron (Fe): ≤ 20 ppm
Silicon (Si): ≤ 15 ppm
Copper (Cu): ≤ 5 ppm
Electrical conductivity: ≥ 63% IACS
Density: 2.70 g/cm³
Aluminum A6H
Purity of base material: ≥ 99.9999%
Total impurity content: ≤ 0.0001% (1 ppm)
Iron (Fe): ≤ 1 ppm
Silicon (Si): ≤ 0.5 ppm
Copper (Cu): ≤ 0.3 ppm
Electrical conductivity: ≥ 64.5% IACS
Density: 2.70 g/cm³
The material is designed for use in industries where the following are critical:
→ Ultra-low impurity content for stable electrical properties
→ Reproducible characteristics in mass production
→ Compliance with international standards for export
SUBMIT A REQUEST
Why our high-purity aluminum is the choice of professionals
Precision cleaning equipment
• Electrolyzers with automated potential and temperature control
• Zone melting units with CNC for programmable zone movement
• Real-time monitoring systems: spectral analysis of the melt
Deep analytics and impurity control​
• Gas discharge mass spectrometry (GDMS) — detection of impurities down to 0.1 ppb
• Inductively coupled plasma mass spectrometry (ICP-MS) — quantitative analysis
• Electron microscopy (SEM/EDS) — visualization of structure and local composition
• Each batch is accompanied by a protocol detailing all controlled elements
Controlled crystallization
and structure
Controlled crystallization
and structure
• Programmable cooling to form a fine-grained, homogeneous structure
• Elimination of liquation (uneven distribution of impurities) throughout the ingot volume
• Stable reproduction of characteristics from batch to batch (±0.0001% for 6H)
Product protection
before shipment
Product protection before shipment
• Sealed packaging immediately after finishing
• Storage in a controlled environment: humidity ≤ 30%, temperature +15…+25 °C
• Full traceability: batch number → raw materials → process parameters → analysis
• Sealed packaging immediately after finishing
• Storage in a controlled environment: humidity ≤ 30%, temperature +15…+25 °C
• Full traceability: batch number → raw materials → process parameters → analysis

High purity aluminum ingots
А99, А4Н6
High-purity aluminum ingots. Obtained by double
electrolysis in a protective atmosphere.
Chemical purity: 99.996 - 99.9985%, impurity content:
- Metals Basis, GOST, ASTM;
- TU 48-0533-058-91 "High-Purity Aluminum. Specifications"
Size:
✓ 16 kg ingots, 1-ton pallets.
HS Code: 7601100000 "Unalloyed, Unworked Aluminum"
    High purity aluminum ingots
    А5Н, А5Н5
    High-purity aluminum ingots. Obtained by zone melting.
    Chemical purity: 99.999 - 99.9995%, impurity content:
    - Metals Basis, GOST, ASTM;
    - TU 48-0533-058-91 "High-Purity Aluminum. Specifications"
    Size:
    ✓ Half-round and round ingots, 2.5 - 6 kg.
    HS Code: 7601100000 "Unalloyed, Unworked Aluminum"
      High purity aluminum ingots А6Н
      High-purity aluminum ingots. Obtained by zone melting
      of refined blanks.
      Chemical purity: 99.9999%, impurity content,
      - Metals Basis, GOST, ASTM;
      - TU 48-0533-058-91 "High-Purity Aluminum. Specifications"
      Size:
      ✓ Half-round and round ingots, 2.5 - 6 kg.
      HS Code: 7601100000 "Unalloyed, Unworked Aluminum"
        Sampling from each batch submitted by the customer for certification is performed by a representative of the certification laboratory and is strictly accountable. All containers are labeled and sealed.
        Analysis methods: Spark-gap mass spectrometry on a JMS-01-BM2 mass spectrometer using the "Mass Spectral Determination of Impurities (MSOP) B 1.1" method.
        Ultra-low impurity content
        • 6H purity → total impurities ≤ 1 ppm → stable electrical and optical properties
        • Control of critical elements (Fe, Si, Cu) at the ppb level → predictability in high-precision processes
        • Ideal for semiconductors, optics, and quantum technologies
        Reproducibility of characteristics
        • Homogeneous structure throughout the entire volume → stable properties
        in serial production
        • Batch-to-batch consistency → reduced incoming inspection costs
        at the customer's site
        • Reliability of experimental data in R&D and laboratory studies
        Minimal oxidation and high stability
        • Sealed packaging in an inert environment → maintains surface cleanliness until use
        • Low oxygen content in the metal volume → no defects
        during subsequent processing
        • Long shelf life without loss of properties, provided the conditions are met
        Flexibility to suit the task
        • Choice of purity: 4H6-4H8 for industrial applications / 5H-6H for high-tech applications
        • Custom geometry and packaging for customer equipment and processes
        • Available for both testing samples and production batches
        Consultation
        Sampling from each batch submitted by the customer for certification is performed by a representative of the certification laboratory and is strictly accountable. All containers are labeled and sealed.
        Analysis methods: Spark-gap mass spectrometry on a JMS-01-BM2 mass spectrometer using the "Mass Spectral Determination of Impurities (MSOP) B 1.1" method..
        Ultra-low impurity content
        • 6H purity → total impurities ≤ 1 ppm → stable electrical and optical properties
        • Control of critical elements (Fe, Si, Cu) at the ppb level → predictability in high-precision processes
        • Ideal for semiconductors, optics, and quantum technologies
        Reproducibility of characteristics
        • Homogeneous structure throughout the entire volume → stable properties
        in serial production
        • Batch-to-batch consistency → reduced incoming inspection costs
        at the customer's site
        • Reliability of experimental data in R&D and laboratory studies
        Minimal oxidation and high stability
        • Sealed packaging in an inert environment → maintains surface cleanliness until use
        • Low oxygen content in the metal volume → no defects
        during subsequent processing
        • Long shelf life without loss of properties, provided the conditions are met
        Flexibility to suit the task
        • Choice of purity: 4H6-4H8 for industrial applications / 5H-6H for high-tech applications
        • Custom geometry and packaging for customer equipment and processes
        • Available for both testing samples and production batches
        Consultation
        Solutions for your industries
        Semiconductor and microelectronics industry
        Applications:
        • Substrates and dopants for microcircuit manufacturing
        • Contact materials and interconnects in integrated circuits
        • Raw materials for epitaxial growth of semiconductor layers

        Why VPR aluminum:
        ✓ 6H purity → minimized crystal lattice defects, stable parameters
        ✓ Impurity control at the ppb level → compliance with process technology requirements < 10 nm
        ✓ Documented confirmation of characteristics → simplified supplier qualification
        Optics, photonics and laser technologies​
        Applications:
        • Mirrors and reflective coatings for laser systems
        • Optical components for UV and IR ranges
        • Substrates for thin-film coatings and photonic crystals

        Why choose VPR aluminum:
        ✓ Ultra-low impurity content → high reflectivity, minimal loss
        ✓ Homogeneous structure → no light scattering from inhomogeneities
        ✓ Stable optical properties over a wide temperature range
        Aerospace and precision alloys
        Applications:
        • Alloying aluminum alloys for aerospace components
        • Production of precision alloys with specified mechanical properties
        • Specialized materials for critical aircraft components

        Why choose VPR aluminum:
        ✓ Precise chemical composition → predictable mechanical and corrosion properties
        ✓ Absence of gas inclusions → increased reliability and service life
        ✓ Certification according to international standards → approval for regulated industries
        Scientific research and quantum technologies​
        Applications:
        • Reference materials for calibrating analytical equipment
        • Research in superconductivity, quantum computing, and nanotechnology
        • Development of new functional materials and coatings

        Why choose VPR aluminum:
        ✓ Reproducible characteristics → Reliable and publishable experimental data
        ✓ Custom specifications → Suitable for fundamental research purposes
        ✓ Full documentation support → Compliance with grant and international project requirements
        Power engineering and high-precision equipment
        Applications:
        • Raw material for the production of high-purity conductors and busbars
        • Components for precision measurement and control systems
        • Materials for fusion and research reactors

        Why choose VPR aluminum:
        ✓ Minimal dissipation losses → increased efficiency of energy-efficient systems
        ✓ Stable properties under extreme loads → reliability in critical applications
        ✓ Full batch traceability → compliance with quality and safety requirements
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        Your right solution in high-purity metal supply
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        LEX PRIME
        Your right solution in high-purity metal supply
        Copper powders
        Copper ingots
        Zinc powders
        8 (916) 718 - 73 - 15
        info.vpr-export@yandex.ru
        8 (922) 020 - 66 - 50
        8 (343) 383 - 35 - 04
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        Consent to the processing of personal data
        2021-2026 ООО "Your Right Decision" High-Purity Metals from the Manufacturer
        8 (916) 718 - 73 - 15
        8 (922) 020 - 66 - 50
        8 (343) 383 - 35 - 04
        Personal data processing policy
        Consent to the processing of personal data
        2021-2026 ООО "Your Right Decision" High-Purity Metals from the Manufacturer
        info.vpr-export@yandex.ru